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Atomic Layer Deposition (ALD)

Make/model Beneq, ALD, Thin Film System TFS200.
Details From summer 2019: ALD deposition of TiO2, TiN, Ta2O5, Al2O3, ZnO, SiO2, SiN, NiO, ITO, MoO.
Facility Institute for Compound Semiconductors
School Physics and Astronomy

Get in touch

Saleem Shabbir

Email
ics@cardiff.ac.uk

Location

Queen's Buildings
5 The Parade
Newport Road
CF24 3AA